๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Energy and fluence dependence of the sputtering yield of silicon bombarded with argon and xenon

โœ Scribed by Blank, P.; Wittmaack, K.


Book ID
121840856
Publisher
American Institute of Physics
Year
1979
Tongue
English
Weight
909 KB
Volume
50
Category
Article
ISSN
0021-8979

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Sputtering yield of chromium by argon an
โœ A. K. Handoo; P. K. Ray ๐Ÿ“‚ Article ๐Ÿ“… 1992 ๐Ÿ› Springer ๐ŸŒ English โš– 286 KB

A radioactive tracer technique is described for the quantitative measurement of the sputtering yield of a target material electroplated on a copper substrate. Sputtering yields of chromium by argon and xenon ions with energies from 50 to 500eV are reported. The ion beams, having a current density ra