Emission mechanisms of bulk GaN and InGaN quantum wells prepared by lateral epitaxial overgrowth
β Scribed by Chichibu, S. F.; Marchand, H.; Minsky, M. S.; Keller, S.; Fini, P. T.; Ibbetson, J. P.; Fleischer, S. B.; Speck, J. S.; Bowers, J. E.; Hu, E.; Mishra, U. K.; DenBaars, S. P.; Deguchi, T.; Sota, T.; Nakamura, S.
- Book ID
- 120501823
- Publisher
- American Institute of Physics
- Year
- 1999
- Tongue
- English
- Weight
- 282 KB
- Volume
- 74
- Category
- Article
- ISSN
- 0003-6951
- DOI
- 10.1063/1.123581
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High-quality GaN/InGaN multiple quantum wells (MQWs) were fabricated on nano-scale epitaxial lateral overgrown (NELO) GaN layers. To grow the NELO layer first a 200 nm-thick SiO 2 was deposited on a 2 mmthick undoped GaN layer. A 10 nm-thick Ni layer was then deposited on the SiO 2 film followed by
InGaN/GaN multiple quantum-wells (MQWs) on Ga-polarity GaN by plasma-assisted molecularbeam epitaxy were grown and characterized. In-situ reflection high-energy-electron diffraction observations and high-resolution X-ray diffraction results indicated that a flat interface and a good periodicity of t