Electronic properties of Mn acceptors in (In,Mn)As grown by metalorganic vapor phase epitaxy
โ Scribed by S.J. May; A.J. Blattner; B.W. Wessels
- Publisher
- Elsevier Science
- Year
- 2003
- Tongue
- English
- Weight
- 205 KB
- Volume
- 340-342
- Category
- Article
- ISSN
- 0921-4526
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โฆ Synopsis
In this study, the nature of the Mn electronic level in (In,Mn)As was investigated. (In,Mn)As thin films were epitaxially deposited on GaAs (0 0 1) substrates using metalorganic vapor phase epitaxy. Electronic transport properties were determined from Hall effect measurements over a temperature range of 78-300 K and all films were found to be p-type. Mn was found to act as a shallow acceptor with an activation energy ranging from 22 to 16 meV as the hole concentration increased from 8.5 ร 10 17 to 1.7 ร 10 18 cm ร3 . In heavily doped films, a large percentage of Mn is found to be electronically inactive and the hole concentrations are up to a factor of 10 3 times smaller than the Mn concentration.
๐ SIMILAR VOLUMES
The metalorganic vapor phase epitaxial (MOVPE) growth of cubic GaN layers on misoriented GaAs (001) substrates, the faces of which were tilted from (001) toward [1 " 10] or [110] by 4 , was performed in order to investigate the effect of the substrate misorientation on the inclusion of hexagonal pha