Electron cyclotron resonance plasma deposition of cubic boron nitride using N-trimethylborazine
β Scribed by A. Weber; U. Bringmann; R. Nikulski; C.-P. Klages
- Book ID
- 107930272
- Publisher
- Elsevier Science
- Year
- 1993
- Tongue
- English
- Weight
- 468 KB
- Volume
- 60
- Category
- Article
- ISSN
- 0257-8972
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## Abstract Boron nitride (BN) films with high crystallinity and phase purity (>80β%) in the cubic phase were synthesized over large areas using fluorine chemistry and electronβcyclotron resonance (ECR) microwave plasma. Plasmaβenhanced fluorine chemistry was provided by a complex H~2~βBF~3~βN~2~βA
Silicon nitride films of various compositions have been deposited on silicon substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition (ECR-PECVD) technique from mixtures of Ar, N and SiH as precursors. Film 2 4 composition and refractive index as a function of deposition p