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Electron beam testing of VLSI circuits assisted by focused ion beam etching

✍ Scribed by Hideaki Arima; Takayuki Matsukawa; Junichi Mitsuhashi; Hiroaki Morimoto; Hidefumi Nakata

Book ID
107920330
Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
951 KB
Volume
4
Category
Article
ISSN
0167-9317

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## Abstract Metal nanowires are one of the potential candidates for nanostructured sensing elements used in future portable devices for chemical detection; however, the optimal methods for fabrication have yet to be fully explored. Two routes to nanowire fabrication, electron‐beam lithography (EBL)