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Electron beam lithography of copolymeric resists containing styrenes and allyl acrylates

✍ Scribed by Jing Shu; Wei Lee; Larry Venable; Gil Varnell

Book ID: 104520338
Publisher: Society for Plastic Engineers
Year: 1983
Tongue: English
Weight: 482 KB
Volume: 23
Category: Article
ISSN: 0032-3888
DOI: 10.1002/pen.760231712

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