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Electromigration reliability of tungsten and aluminum vias and improvements under AC current stress

✍ Scribed by Tao, J.; Young, K.K.; Cheung, N.W.; Hu, C.


Book ID
114535188
Publisher
IEEE
Year
1993
Tongue
English
Weight
876 KB
Volume
40
Category
Article
ISSN
0018-9383

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