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Electrodeposition of Titania Thin Films on Metallic Surface for High-k Dielectric Applications

โœ Scribed by Biplab K. Roy; Guangneng Zhang; Roy Magnuson; Mark Poliks; Junghyun Cho


Book ID
109262748
Publisher
John Wiley and Sons
Year
2010
Tongue
English
Weight
964 KB
Volume
93
Category
Article
ISSN
0002-7820

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Strontium tantalate (STO) films were grown by liquid-delivery (LD) metalorganic chemical vapor deposition (MOCVD) using Sr[Ta(OEt) 5 (OC 2 H 4 OMe)] 2 as precursor. The deposition of the films was investigated in dependence on process conditions, such as substrate temperature, pressure, and concentr