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Electrical properties of a B doped layer in diamond formed by hot B implantation and high-temperature annealing

✍ Scribed by Tsubouchi, Nobuteru; Ogura, M.; Mizuochi, N.; Watanabe, H.


Book ID
121896838
Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
550 KB
Volume
18
Category
Article
ISSN
0925-9635

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## Abstract We have followed the evolution of the electrical and infrared absorption properties of two phosphorus‐doped epitaxial layers under a series of isochronal annealings between 800 Β°C and 1400 Β°C. In the as‐grown state, one sample is weakly compensated (__N~a~__/__N~d~__= 0.15) while the ot