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Electrical characterization of ultra-shallow junctions formed by diffusion from a CoSi2 layer

✍ Scribed by La Via, F.; Rimini, E.

Book ID: 114536751
Publisher: IEEE
Year: 1997
Tongue: English
Weight: 310 KB
Volume: 44
Category: Article
ISSN: 0018-9383
DOI: 10.1109/16.563354

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