The effect of Co incorporation on electrical characteristics of n +/p shallow junction formed by dopant implantation into CoSi 2 and anneal

✍ Scribed by Ji-Soo Park; Dong Kyun Sohn; Jong-Uk Bae; Chang Hee Han; Jin Won Park

• Book ID: 114538150
• Publisher: IEEE
• Year: 2000
• Tongue: English
• Weight: 138 KB
• Volume: 47
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.841231