Comparison of p+–n junction formed by BF2+ and B+ implantation in silicon microstrip detector with low and high thermal budget: impact of fluorine on electrical characteristics

✍ Scribed by Ajay K. Srivastava; Ashutosh Bhardwaj; Kirti Ranjan; Namrata; Sudeep Chatterji; R.K. Shivpuri

• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 458 KB
• Volume: 6
• Category: Article
• ISSN: 1369-8001
• DOI: 10.1016/j.mssp.2003.07.012