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Electrical characterization of silicon surface after reactive ion etching of silicon dioxide by CHF3

✍ Scribed by K.Y. Tong; K.W. Yip; W.M. Fung

Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 187 KB
Volume: 30
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(90)90289-y

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