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Selective reactive ion etching of silicon dioxide : J. S. Chang. Solid St. Technol. 214 (April 1984)

Publisher: Elsevier Science
Year: 1984
Tongue: English
Weight: 129 KB
Volume: 24
Category: Article
ISSN: 0026-2714
DOI: 10.1016/0026-2714(84)91025-4

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