✦ LIBER ✦
Dielectric breakdown of gate insulator due to reactive ion etching : Tohru Watanabe and Yukimasa Yoshida. Solid St. Technol. 263 (April 1984)
- Publisher
- Elsevier Science
- Year
- 1984
- Tongue
- English
- Weight
- 126 KB
- Volume
- 24
- Category
- Article
- ISSN
- 0026-2714
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