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Selective reactive ion etching of silicon dioxide: J.S. Chang Solid St. Technol. 214 (April 1984)

Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 92 KB
Volume: 16
Category: Article
ISSN: 0026-2692
DOI: 10.1016/s0026-2692(85)80053-7

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