๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Electrical characterization of low temperature deposited TiO2 films on strained-SiGe layers

โœ Scribed by G.K. Dalapati; S. Chatterjee; S.K. Samanta; C.K. Maiti

Book ID
108418040
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
182 KB
Volume
210
Category
Article
ISSN
0169-4332

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Electrical characterization of TiO2 gate
Electrical characterization of TiO2 gate oxides on strained-Si
โœ C.K. Maiti; S.K. Samanta; G.K. Dalapati; S.K. Nandi; S. Chatterjee ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 190 KB

The electrical properties of low temperature (150 ยฐC) plasma deposited TiO 2 gate dielectrics on strained-Si are reported. The deposited films have been analyzed by X-ray photoelectron spectroscopy for chemical composition. The interfacial and electrical properties of the deposited films have been c

Low temperature deposition and character
Low temperature deposition and characterization of TiO2 photocatalytic film through cold spray
โœ Guan-Jun Yang; Chang-Jiu Li; Feng Han; Wen-Ya Li; Akira Ohmori ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 706 KB

Cold spray was employed as a novel low temperature approach to deposit titanium dioxide (TiO 2 ) photocatalytic film. The film microstructure was characterized using X-ray diffraction and scanning electron microscopy. The photocatalytic performance was examined through acetaldehyde degradation under