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Electrical characteristics of ALD-deposited Al 2 O 3 thin films on p-type germanium substrates

✍ Scribed by Botzakaki, M.; Kerasidou, A.; Xanthopoulos, N.; Skarlatos, D.; Kennou, S.; Ladas, S.; Georga, S. N.; Krontiras, C. A.

No coin nor oath required. For personal study only.

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