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Electrical and Optical Properties of Stacking Faults in 4H-SiC Devices

✍ Scribed by Bin Chen; Jun Chen; Takashi Sekiguchi; Takasumi Ohyanagi; Hirofumi Matsuhata; Akimasa Kinoshita; Hajime Okumura


Book ID
107455856
Publisher
Springer US
Year
2010
Tongue
English
Weight
388 KB
Volume
39
Category
Article
ISSN
0361-5235

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πŸ“œ SIMILAR VOLUMES


Formation and properties of stacking fau
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A high density of double stacking faults consisting of six Si-C bilayers in cubic stacking sequence could be observed in 4H-SiC crystals with nitrogen doping concentrations exceeding 2 Γ‚ 10 19 cm Γ€3 after annealing at temperatures above 1100 1C. The double stacking faults form by glide of two partia

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## Abstract We report the results of a cathodoluminescence (CL) investigation performed on as‐grown stacking faults in a thick, undoped, 4H‐SiC epitaxial layer grown by CVD. To investigate the size and optical signature of the defects we used, first, room‐temperature (RTCL) and then low‐temperature

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The optical properties of major in-grown stacking faults (IGSFs) in 4H-SiC epilayers have been characterized by micro-photoluminescence (micro-PL) spectroscopy and its intensity mapping. Strong PL emissions from the IGSFs are observed even at room temperature. Three kinds of IGSFs have been identifi