We have compared, using cycling voltammetry, the corrosion resistance in (1 M) H,S04 solutions of TA6V alloy prior to and after N+ ion implantation of unalloyed titanium and of PVD nitrided titanium. The superlicial oxides grown during polarization were analysed using GDOS technique: concentration p
Effects on the implanted profiles of point defect flux during nitrogen implantation in copper
β Scribed by D.C. Kothari; A. Miotello
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 296 KB
- Volume
- 43
- Category
- Article
- ISSN
- 0169-4332
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