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Effects of thermal processes after silicidation on the performance of TiSi2/polysilicon gate device

โœ Scribed by Se-Aug Jang; Tae-Kyun Kim; In-Seok Yeo; Hyeon-Soo Kim; Sahng-Kyoo Lee

Book ID
114537944
Publisher
IEEE
Year
1999
Tongue
English
Weight
98 KB
Volume
46
Category
Article
ISSN
0018-9383

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