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Effects of superimposed pulse bias on TiN coating in cathodic arc deposition

✍ Scribed by Li Zhengyang; Zhu Wubiao; Zhang Yong; Li Guiying; Cao Eryan


Book ID
108422756
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
186 KB
Volume
131
Category
Article
ISSN
0257-8972

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Effects of substrate bias and argon flux
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## Abstract High‐quality titanium nitride (TiN) films with nano‐structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in‐plane β€œS” filter. The effects of substrate bias and argon flux on the crystal grain size, roughness