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Effects of Substrate Pre-deposition Annealing and Deposition Parameters on the Properties of RF Sputter-deposited ZnO Films

✍ Scribed by Oder, T. N.; McMaster, M.; Smith, A.; Velpukonda, N.; Sternagle, D.

Book ID
120064171
Publisher
Cambridge University Press
Year
2012
Weight
395 KB
Volume
1394
Category
Article
ISSN
0272-9172

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## Abstract Influences of O~2~/Ar flux ratio (__R__) on surface morphology and structural evolution have been studied in the case of ZnO films deposited on glass substrates by radio‐frequency (rf) magnetron sputtering. Results of atomic force microscopy (AFM), X‐ray diffraction, and X‐ray photoelec