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Effects of substrate bias and nitrogen flow ratio on the resistivity, composition, crystal structure, and reflectance of reactively sputtered hafnium-nitride film

✍ Scribed by Jiann-Shing Jeng; Chin-Hung Liu; J.S. Chen

Book ID: 116605371
Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 548 KB
Volume: 486
Category: Article
ISSN: 0925-8388
DOI: 10.1016/j.jallcom.2009.07.023

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