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Effects of SF6 plasma treatment on electrical characteristics of TaN-Al2O3-InP metal-oxide-semiconductor field-effect transistor

✍ Scribed by Wang, Yanzhen; Chen, Yen-Ting; Xue, Fei; Zhou, Fei; Lee, Jack C.

Book ID: 120587208
Publisher: American Institute of Physics
Year: 2012
Tongue: English
Weight: 977 KB
Volume: 101
Category: Article
ISSN: 0003-6951
DOI: 10.1063/1.4745203

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