𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effects of ion bombardment on microcrystalline silicon growth by inductively coupled plasma assistant magnetron sputtering

✍ Scribed by YangYang He, YuanJun Su, Ming Zhu…


Book ID
120800259
Publisher
Science in China Press (SCP)
Year
2012
Tongue
English
Weight
641 KB
Volume
55
Category
Article
ISSN
1672-1799

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES


Effect of initial crystallized silicon l
✍ H.C. Lee; H.B. Kim; G.Y. Yeom; I.H. Park; Y.W. Kim 📂 Article 📅 2008 🏛 Elsevier Science 🌐 English ⚖ 902 KB

Using an internal inductively coupled plasma (ICP)-type-plasma enhanced vapor deposition system, microcrystalline silicon thin films were deposited as a function of H 2 /SiH 4 gas ratio at 180 °C. Especially, the effects of deposition with/without an initial thin silicon layer formed with a very hig