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Effects of fast secondary electrons to low-voltage electron beam lithography

✍ Scribed by Joy, David C.

Book ID
121708180
Publisher
The International Society for Optical Engineering
Year
2007
Tongue
English
Weight
678 KB
Volume
6
Category
Article
ISSN
1932-5150

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A novel nanocomposite photoresist was synthesized and characterized for use in both low and high voltage electron beam lithography. This resist system is shown to display the ideal combination of both enhanced etch resistance and enhanced sensitivity required to satisfy both low and high voltage pat