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Effects of ethylene gas flow rate on optoelectrical properties of nitrogenated thin amorphous carbon films grown by microwave surface wave plasma CVD

✍ Scribed by Ghimire, Dilip C.; Adhikari, S.; Aryal, H.R.; Mominuzzamn, S.M.; Soga, T.; Jimbo, T.; Uchida, H.; Umeno, M.

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