𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Effects of buried oxide layer on indium diffusion in separation by implantation of oxygen

✍ Scribed by Chen, Peng; Zhu, Ming; Fu, Ricky K. Y.; Chu, Paul K.; An, Zhenghua; Liu, Weili; Montgomery, Neil; Biswas, Sukanta


Book ID
118744512
Publisher
American Institute of Physics
Year
2004
Tongue
English
Weight
399 KB
Volume
96
Category
Article
ISSN
0021-8979

No coin nor oath required. For personal study only.


πŸ“œ SIMILAR VOLUMES


Effects of internal postoxidation on the
✍ Kwang Soo Seol; Hidemi Koike; Tsuyoshi Futami; Yoshimichi Ohki πŸ“‚ Article πŸ“… 2000 πŸ› John Wiley and Sons 🌐 English βš– 151 KB

Effects of internal postoxidation on buried silicon dioxide have been studied. The dioxide examined was the buried insulator in a silicon-on-insulator (SOI) structure fabricated by implantation of oxygen ions into Si, or the SIMOX process. Internal postoxidation is an oxidation process applied to th