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Effects of addition of oxygen and water vapor in high thermal nitridation processes of SiO2 thin films

โœ Scribed by B. Balland; J.C. Bureau; A. Benamar; J.J. Dubray; A. Glachant


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
296 KB
Volume
39
Category
Article
ISSN
0169-4332

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