๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Effect of the bias voltage on the structure of carbon nitride films

โœ Scribed by Champi, A.; Marques, F.C.; Freire, F.L.

Book ID
122988251
Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
118 KB
Volume
13
Category
Article
ISSN
0925-9635

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Effects of deposition temperature on the
Effects of deposition temperature on the structure of amorphous carbon nitride films
โœ M. Therasse; M. Benlahsen ๐Ÿ“‚ Article ๐Ÿ“… 2004 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 134 KB

Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character

Effect of bias voltage on Diamond-like c
Effect of bias voltage on Diamond-like carbon film deposited on PMMA substrate
โœ Zeng Lin; Shao-Bo Lv; Zhao-Ji Yu; Ming Li; Tie-Yuan Lin; De-Chun Ba; Chi-Kyu Cho ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 482 KB

Bilayered films composed of Diamond-like carbon (DLC) and silicon (Si) were prepared on the surface of polymethylmethacrylate (PMMA) substrates using plasma enhanced chemical vapor deposition (PECVD) and magnetron sputtering deposition. The deposited films were investigated by means of Atomic force