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Effect of substrate temperature on the electrically conductive stability of sputtered NiO films

✍ Scribed by Wei-Luen Jang; Yang-Ming Lu; Weng-Sing Hwang; Tung-Li Hsiung; H. Paul Wang

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
465 KB
Volume
202
Category
Article
ISSN
0257-8972

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## Abstract Cuprous oxide (Cu~2~O) films were formed by dc reactive magnetron sputtering onto glass substrates held at various temperatures in the range 303–648 K. The substrate temperature was found to be an important parameter in controlling the physical properties of the deposited films. The var