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Effect of substrate temperature on growth process of GaAs on Si(1 1 0) vicinal surface studied by reflection high-energy electron diffraction

✍ Scribed by Hiroyuki Usui; Hidehiro Yasuda; Hirotaro Mori


Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
904 KB
Volume
40
Category
Article
ISSN
1386-9477

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✦ Synopsis


Effect of substrate temperature on growth process were studied for GaAs on Si(1 1 0) vicinal surface by reflection high-energy electron diffraction. At the substrate temperature of 473 K, three-dimensional islands of misoriented GaAs are formed on the vicinal surface. At 573 K, three-dimensional GaAs islands with low density epitaxially grow at the step edges of the vicinal surface. At 673 K, twodimensional GaAs layer flattens the vicinal surface. The kinetics of Ga adatoms diffusing on the vicinal surface can explain the change in the growth process, which depends on the substrate temperature.


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