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Effect of substrate preparation and deposition conditions on the preferred orientation of TiN coatings deposited by RF reactive sputtering

✍ Scribed by M.I Jones; I.R McColl; D.M Grant

Book ID: 108422786
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 398 KB
Volume: 132
Category: Article
ISSN: 0257-8972
DOI: 10.1016/s0257-8972(00)00867-7

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