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Effect of substrate biasing and temperature on AlN thin film deposited by cathodic arc ion

✍ Scribed by Khan, Shakil; Mehmood, Mazhar; Saeed, Shaukat; Khan, Taj. M.; Sadiq, Gulfam; Ahmed, Ishaq

Book ID
120981503
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
745 KB
Volume
16
Category
Article
ISSN
1369-8001

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## Abstract Hexagonal aluminium nitride (AlN) and zinc oxide (ZnO) thin films have been deposited by DC and RF reactive magnetron sputtering at room temperature. For a first set of samples, sputtered AlN films were deposited on silicon ZnO substrate. For a second set, ZnO films were deposited on Al