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Effect of sputtering parameters and substrate composition on the structure of tantalum thin films

✍ Scribed by Hallmann, Lubica; Ulmer, Peter

Book ID
120359440
Publisher
Elsevier Science
Year
2013
Tongue
English
Weight
306 KB
Volume
282
Category
Article
ISSN
0169-4332

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✍ S.V. Jagadeesh Chandra; S. Uthanna; G. Mohan Rao πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 669 KB

dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent