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Effects of sputtering pressure on compositions and structures of fresnoite thin films

✍ Scribed by Mankang Zhu; Liying Liu; Yudong Hou; Hui Yan; J.B. Xu; Mingming Shao; Xiaoyang Chen


Book ID
108238645
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
220 KB
Volume
355
Category
Article
ISSN
0921-4526

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Aluminium-nitride films were prepared on glass substrates by reactive radio frequency (r.f.) magnetron sputtering in argon/nitrogen gas mixtures containing 25 --~ 75% nitrogen at substrate temperatures below 150 Β°C. It is important to control the crystallographic orientation and the surface morpholo