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Effect of Silicon Dioxide Hardness on Scratches in Interlevel Dielectric Chemical–Mechanical Polishing

✍ Scribed by Kwon, Tae-Young; Cho, Byoung-Jun; Venktesh, R. Prasanna; Ramachandran, Manivannan; Kim, Hyuk-Min; Hong, Chang-Ki; Park, Jin-Goo

No coin nor oath required. For personal study only.

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