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Effect of silicidation on silicon-based thin film resistors in SiGe integrated circuits

✍ Scribed by Sang-Heung Lee; Seung-Yun Lee; Chan Woo Park; Dongwoo Suh

Book ID
106398195
Publisher
Springer US
Year
2008
Tongue
English
Weight
372 KB
Volume
20
Category
Article
ISSN
0957-4522

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## Abstract In this paper, effective dielectric constant, line attenuation, and characteristic impedance of thin film microstrip line (TFML) on polyimide dielectric as interconnection for radio frequency integrated circuits is investigated. The TFML is fabricated on low cost low resistivity silicon