Influence of Si Doping on the Subgrain S
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Molina, S. I. ;SΓ‘nchez, A. M. ;Pacheco, F. J. ;GarcΓa, R. ;SΓ‘nchez-GarcΓa, M. A.
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Article
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1999
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John Wiley and Sons
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English
β 255 KB
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This work presents a detailed study of the subgrain structure of Si doped GaN grown on AlN buffered (111)Si substrates by plasma-assisted Molecular Beam Epitaxy. Si doping increases from an unintentionally undoped sample up to 1.7 Γ 10 19 cm -3 . The subgrain size distribution fits quite precisely a