✦ LIBER ✦

Effect of radio frequency power on the inductively coupled plasma etched Al0.65Ga0.35N surface

✍ Scribed by Y. Bai; J. Liu; P. Ma; B. Li; J. Zhu; L.W. Guo; X.Y. Liu

Publisher: Elsevier Science
Year: 2010
Tongue: English
Weight: 630 KB
Volume: 256
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2010.03.150

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The effect of discharge conditions on th

The effect of discharge conditions on the inductively coupled plasma oxidation of silicon

✍ S. Taylor; G. Kennedy; W. Eccleston 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 388 KB

Effect of radiofrequency power on laser

Effect of radiofrequency power on laser induced fluorescence and emission spectrometry with an extended-sleeve inductively-coupled plasma torch

✍ X Huang; D Mo; K.S Yeah; J.D Winefordner 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 437 KB

and Cu-I lines with an extended inductively-coupled plasma (ICP) torch. In most cases, the relationships were different from those found in previous studies with a conventional short ICP torch. In some cases, unexpected double maxima or minima occurred. A study of the effect of an easily ionized ele

Study of Pd/Au metallisation and surface

Study of Pd/Au metallisation and surface characteristics on Mg-doped GaN induced by low power inductively coupled plasma etching

✍ A. Baharin; M. Kocan; U.K. Mishra; G. Parish; B.D. Nener 📂 Article 📅 2010 🏛 Elsevier Science 🌐 English ⚖ 430 KB

The Influence of a Torch Extension on th

The Influence of a Torch Extension on the Detection Power of an Inductively Coupled Argon Plasma Used in Atomic Emission Spectrometry

✍ P. D. P. Taylor 📂 Article 📅 2010 🏛 Wiley (John Wiley & Sons) ⚖ 210 KB 👁 1 views

The Effect of the H2 Flow Rate on the De

The Effect of the H2 Flow Rate on the Deposition of TiO2 Film Produced by Inductively Coupled Plasma-Assisted CVD

✍ Dong-Su Jang; Soon-Ho Kwon; Hee-Yong Lee; Won-Kyun Yang; Jung-Joong Lee 📂 Article 📅 2009 🏛 John Wiley and Sons 🌐 English ⚖ 504 KB

## Abstract Titanium dioxide (TiO~2~) films are produced by inductively coupled plasma‐assisted (ICP) CVD at various H~2~ flow rates. Anatase and rutile TiO~2~ films are obtained without any external heating. The surface morphologies, structures, and deposition rates of the TiO~2~ films are strongl

Effect of low-frequency power on etching

Effect of low-frequency power on etching of SiCOH low-k films in CHF3 13.56 MHz/2 MHz dual-frequency capacitively coupled plasma

✍ Chao Ye; Yijun Xu; Xiaojiang Huang; Zhenyu Xing; Jing Yuan; Zhaoyuan Ning 📂 Article 📅 2009 🏛 Elsevier Science 🌐 English ⚖ 540 KB