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Effect of plasma parameters on the structure of CNx layers deposited by DC magnetron sputtering

✍ Scribed by Ujvári, T.; Szikora, B.; Mohai, M.; Tóth, A.; Keresztury, G.; Bertóti, I.


Book ID
121466855
Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
119 KB
Volume
11
Category
Article
ISSN
0925-9635

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## Abstract In this study, the deposition temperature effects on the properties of hydrogenated amorphous silicon films are reported. The a‐Si:H thin films were deposited by DC magnetron sputtering technique, according to a new protocol of deposition. This last consists of a successively several th