𝔖 Bobbio Scriptorium

✦ LIBER ✦

Effect of oxygen on fluorine-based remote plasma etching of silicon and silicon dioxide: Lee M Loewenstein, J Vac Sci Technol, A6, 1988, 1984–1988

Book ID: 103468551
Publisher: Elsevier Science
Year: 1989
Tongue: English
Weight: 148 KB
Volume: 39
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(89)90532-0

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