Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition: Sang S Kim et al,J Vac Sci Technol,A6, 1988, 1740–1744

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 153 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)90815-4