✦ LIBER ✦
7505. Formation of device quality Si/SiO2 interfaces at low substrate temperatures by remote plasma enhanced chemical vapor deposition of SiO2: G Lucovsky et al,J Vac Sci Technol, A8, 1990, 822–831
- Publisher
- Elsevier Science
- Year
- 1991
- Tongue
- English
- Weight
- 148 KB
- Volume
- 42
- Category
- Article
- ISSN
- 0042-207X
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