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Effect of N2-gas flow rates on the structures and properties of copper nitride films prepared by reactive DC magnetron sputtering

✍ Scribed by Li, Xing’ao; Bai, Qiufei; Yang, Jianping; Li, Yongtao; Wang, Lixia; Wang, Haiyun; Ren, Shanling; Liu, Shengli; Huang, Wei

No coin nor oath required. For personal study only.

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