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Effect of heat treatment on the stress and structure evolution of plasma deposited boron nitride thin films

✍ Scribed by T. Aliyeva Anutgan; M. Anutgan; O. Ozdemir; I. Atilgan; B. Katircioglu

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
800 KB
Volume
202
Category
Article
ISSN
0257-8972

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Thin carbon films are used to hermetically seal and improve the performance of devices exposed to extreme conditions. Such films, which are deposited by chemical vapor deposition, develop residual thermal stresses due to a mismatch in the coefficient of thermal expansion between the film and substra