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Effect of deposition condition on residual stress of iron nitride thin films prepared by magnetron sputtering and ion implantation

✍ Scribed by W.L. Li; W.D. Fei; T. Hanabusa

Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
370 KB
Volume
252
Category
Article
ISSN
0169-4332

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