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Effect of electric charge accumulation on low energy ion implantation in insulators

✍ Scribed by M. Yedji; G.G. Ross

Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
166 KB
Volume
230
Category
Article
ISSN
0168-583X

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Being able to accurately predict dopant profiles at sub-keV implant energies is critical for the microelectronic industry. Molecular Dynamics (MD), with its capability to account for multiple interactions as energy lowers, is an increasingly popular simulation method. We report our work on sub-keV i