Effect of deposition temperature on diel
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Hwan Seong Moon; Jae Suk Lee; Sung Wook Han; Jong Wan Park; Jae Hak Lee; Seung K
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Article
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1994
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Springer
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English
โ 308 KB
Tantalum oxide film formation by plasma-enhanced chemical vapour deposition (PECVD) using TaCI 5 as a source material was examined. The effects of deposition temperature on the formation, structure and electric properties of the Ta205 film were investigated for AI/Ta20J p-Si (MTS) capacitors. The de